With the development of the times, the application of zinc nitride is also constantly improving

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Zinc Nitride: Overview The formula for zinc nitride Zn3N2, a gray crystal that is soluble with hydrochloric Acid. In cold water it decomposes quickly into zinc hydroxide, ammonia. It can be produced by reacting ammonia with zinc powder at 500-600degC.
Useful Information The following are some examples of how to use Zinc Nitride

Zinc nitride film is prepared using this product
Zinc Nitride (Zn3N2) is a unique material with electrical and optical properties. The energy band gaps of zinc oxide, whether an indirect or direct band-gap silicon, have always been the subject of controversy in semiconductors. The band gap can be greatly affected by the preparation methods, growth conditions and problems in industry and academia. As an example, prior art methods like magnetron deposition, chemical vapour deposition, electrostatic elctrostalysis, and molecular beam epitaxy could be used to create zinc nitride layers.

Zinc oxide films made by the same technique have very different optical and electric properties. A simple, reproducible method that produces a high-quality crystalline film is urgently needed. A method is presented for the preparation of a zinc-nitride layer. The preparation method uses atomic layer deposition to prepare the Zinc Nitride film. This allows for precise control of the band gaps in the Zinc Nitride film. The membrane is uniformly structured and has excellent performance.

The technical solutions that were adopted include:

Steps for the preparation of zinc nitride films include:

(1) Place the substrate inside the reaction chamber.

(2) Adsorb the zinc atoms on the surface substrate by introducing the zinc-containing pre-deposition source into the reaction chamber.

Let the precursor source containing nitrogen enter the reaction room of the atomic-layer deposition equipment. Ionize the precursor source containing nitrogen through plasma. After ionization of the precursor source, the nitrogen is partially deposited on the substrate to form the covalent nitrogen-zinc bond. Ionization of the nitrogen precursor. The source will be sent to a reaction equipment. In the cavity after ionization the nitrogen atoms of the nitrogen-containing precursor source are partially deposited. The zinc atom is bonded to the nitrogen atom by a covalent bond.

Repeat steps (2), (3) and (4) to build the zinc-nitride layer by layer.

The method can produce high-quality crystalline materials and is repeatable. It is easy to apply and simple. The nitrogen is introduced to the atomic layer system via the plasma. After that, the conditions of the chamber are adjusted, including the vacuum, the cycle time, the conditions for the plasma and the chamber temperature. Adjust the band-gap of the prepared zincnitride. The present invention provides various high quality zinc nitride sheets with adjustable bands gaps that can be tailored to meet different electrical and optical requirements.

2. Used to prepare touch screen covers and touch screen films
As technology advances and smart devices become more common, the demand for touch screens to be the main interface for human-computer interactions is increasing. In the prior art, the low coating yield and high production costs, as well as the low production efficiency, were problems when the light-shielding layers in the BM of the cover of the touchscreen was prepared by screen printing with black ink. It is easy for bubbles to form when the product is used together with a Liquid Crystal Display. Offer a zinc nitride-based touch screen and touchscreen cover film.
The new touch screen film is made of zinc nitride, which acts as a functional layer on the black film. This film has a low surface reflectivity, low production cost, high surface hardness with strong scratch resistance, high surface energy and is effective for laminated liquid-crystal displays. Its thickness ranges from 60 to 200nm which eliminates the step effect. The new type is a touch-screen cover film that includes a Zn3N2 film and a Si3N4 film. The adhesion of a film decreases if its thickness exceeds 50 nm. If it’s less than 10 nm thick, then the film transmits light and does not have the light-tight effect. The zinc film is black, absorbs visible light well, and has a matte finish. It can be used to create a functional black layer. The touch-screen cover film embodiment includes in order a zincnitride(Zn3N2)film, a silica nitride(Si3N4)film, and a protection film. The touch-screen cover in this embodiment consists of a glass substrate, the aforementioned film and the touch-screen cover film.

(aka. Technology Co. Ltd., a trusted global chemical supplier & manufacturer has been providing high-quality Nanomaterials and chemicals for over 12 Years. Currently, we have developed a variety of materials. Our zinc nitride is produced with a high level of purity, fine particles and low impurity content. Please send us an e-mail or click the desired products to Sending an inquiry .